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ASML Importance 28 Semiconductor Engineering

3D Mask Effects Enhance Imaging in High-NA EUV and Hyper-NA EUV Litho (Fraunhofer, ASML)

[ASML] Researchers at the Fraunhofer Institute for Integrated Systems and Device Technology IISB and ASML published a technical paper titled “Benefits of three-dimensional mask (M3D) effects in high-NA and hyper-NA EUV lithography.” Excerpt: “This study aims to offer an alternative perspective on M3D effects in EUV lithography. We demonstrate that M3D effects can be harnessed under... » read more The post 3D Mask Effects...

Importance 18 Semiconductor Engineering

Litho Patterning of Conformal Thin-Film Coatings on Complex 3D Structures (KTH Royal)

Researchers at KTH Royal Institute of Technology published a technical paper titled “Lithographic patterning of conformal thin films on 3D structures using Scaffold-architected Lift-off masks.” Abstract Excerpt: “Here we present a robust approach for patterning of conformal thin-film coatings on complex 3D structures.” “It is agnostic to the used thin-film deposition process and enables even... » read more The post...

ASML Importance 1 EE Times

ASML Raises Outlook, Plans More EUV Capacity

[ASML | AI] ASML raised its full-year outlook as AI demand prompted plans to expand lithography capacity through at least 2028. The post ASML Raises Outlook, Plans More EUV Capacity appeared first on EE Times .

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